The Centro Nacional de Microelectrónica (CNM) is a non-profit research institute of the Spanish Research Council (Consejo Superior de Investigaciones Científicas, CSIC) that was established in 1985 to support the Spanish and European industry and scientific community in the use of microelectronics. The Barcelona Microelectronics Institute (IMB) of CNM is focused on research and development in silicon-based micro- and nano-electronics. Activities in silicon microsystems started at IMB in 1989, and have included work in mechanical, chemical and radiation sensors, microactuators, microfluidics, CAD/simulation tools and CMOS-integrated sensor systems.

Nanofabrication activities started in 2002. CNM-IMB has a full CMOS line for integrated circuit fabrication, with integrated facilities for silicon micromachining, nanolithography and nanofabrication. The clean-room of IMB was considered a large-scale facility within the access to research infrastructures programme of the EC from year 2000 to 2003, and within the Spanish research plan. The IMB staff is about 175 people, which include a professional clean room staff of about 30.


CNM will develop specific microfabricated atomic force microscopy probes, which will be used for the structural and electrical characterization of the or-containing nanosomes immobilized onto the active parts of the nanotransducers. the requirement of spm-based low-noise electrical measurements in a liquid medium forces the development of specific probes.


In the last years CNM-IMB has participated in more than 15 EC-funded R&D projects in the fields of micro and nanosystems (e.g. MICROCARD, GLASSGAS, MICROMAG, NANOMASS, BIOFINGER, SPOT-NOSED, GOODFOOD, NAPA, NOVOPOLY, CHARPAN, HYSYS).

CNM has a large experience in the development of microcantilevers and specific scanning probe microscopy (SPM) probes based on silicon micromachining technology. Within the Optonanogen project (2002-2005) (IST-2001-37239) they developed arrays of microcantilevers for DNA detection based on single-crystalline silicon. In the BioFinger project (2002-2005) (IST-2001-34544), which was coordinated by CNM, they developed piezoresistive micro/nanocantilevers integrated with CMOS circuits for the detection of intermolecular forces [3]. Within the Spanish funded MINAHE and MINAHE2 projects (2003-2008) the group has developed SPM probes with specific properties. As part of their involvement in the Spot-Nosed (2003-2006) project (IST-2001-38899), which partially provided the background for the BOND proposal, they worked in the development of specific conducting SPM probes based on silicon nitride cantilevers.


Research Professor at CNM-IMB
Deputy Director of CNM-IMB

Centro Nacional de Microelectrónica
Campus Universidad Autónoma de Barcelona
08193 Bellaterra (SPAIN)
Tel. + 34 935 947 700
Fax. + 34 935 801 496
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Joan Bausells graduated in physics in 1980, and received M.S. (1982) and Ph.D. (1986) degrees in solid-state physics, all from the University of Barcelona. From 1980 to 1981 he was a post-graduate researcher at Universidad Autónoma de Madrid, Spain. From 1981 to 1986 he worked as a process and R&D engineer in the semiconductor industry. In 1986 he joined CNM-IMB, where he is a permanent researcher since 1988, and Research Professor since 2002. At CNM-IMB he initially worked in silicon processing and later he has been manager of the Sensor and Actuator Group, which he co-founded in 1990, of the Microsystems Department, and of the Nanotechnology Group, established in 2002. Since June 2008 he is Deputy Director of CNM-IMB. He has published more than 70 papers in international journals, and has contributed more than 170 papers to Conferences. He has participated in 14 projects funded by the EC Framework Programmes in the micro- and nano-systems field, and has coordinated two of them. His current research activities are in the field of silicon micro- and nano-electromechanical structures and their applications to silicon devices and microsystems.